Dispersion DoE (Dual Response)

Design with replicates per point — jointly models mean AND dispersion as functions of the factors.

Also known as: dispersion DoE, dual response, dual-response surface

A dispersion DoE (dual response) has at least two true replicates at every design point. From each point two quantities are computed: the mean and the log-variance . Both are separately regressed against the factors.

  • Goal: find factor settings that minimise process variability — independent of the target response
  • Robustness — the classical Taguchi question ("which setting is insensitive to noise?") within a clean factorial structure
  • Precondition: true, independent replicates per run — not multiple measurements on the same specimen (pseudo-replicates capture only measurement variation, not process variation)

See also

Used in

In the Algorithm Lab

Sources

  • Vining, G. G. & Myers, R. H. — Combining Taguchi and Response Surface Philosophies: A Dual Response Approach, Journal of Quality Technology, 22(1), 1990
  • Myers, Montgomery & Anderson-Cook — Response Surface Methodology, 4th Edition, Chapter 10